A non-aqueous hydrofluoric acid based solution used to chemically mill (etch) and/or polish crystalline quartz.
The properties of the solution allow for an “after-etched” surface finish that is typically superior to that of the surface prior to etching.
It is recommended that LATTICE ETCH™ be used at room temperature. This ensures a high quality etch and significantly simplifies equipment setup.
LATTICE ETCH™ can be used for very deep etching without causing surface degradation, making it the ideal solution for the fabrication of inverted-mesa blanks and other complex quartz structures.